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Molybdenum

  • Molybdenum substrate
Molybdenum substrate

Molybdenum substrate

  • Material: Molybdenum 361, MoLa
  • Purity: ≥99.95%
  • Dimension: Customization
  • Standard: ASTM B386-2003, ASTM B387-2010
  • Application: The MPCVD molybdenum substrate holder is a core component in microwave plasma chemical vapor deposition (MPCVD) equipment. Manufactured from high-purity molybdenum, it features a high melting point of
  • INQUIRY


1. Product Overview
The MPCVD (Microwave Plasma Chemical Vapor Deposition) molybdenum substrate holder is a critical component specifically designed for high-temperature and high-pressure environments. It is widely used in semiconductor manufacturing, optical coatings, diamond film deposition, and other fields. With its excellent thermal stability, high melting point, and superior mechanical properties, the molybdenum substrate holder is an indispensable core component in MPCVD equipment.

2. Product Features
- High Melting Point: Molybdenum has a melting point of up to 2620°C, making it suitable for extreme high-temperature environments.
- Excellent Thermal Conductivity: Ensures uniform temperature distribution on the substrate holder surface, preventing localized overheating.
- High Mechanical Strength: Maintains stability under high-stress conditions, extending service life.
- Corrosion Resistance: Performs well in chemically active gases, making it suitable for complex process environments.
- High Purity: Made from high-purity molybdenum, reducing impurity contamination and improving the quality of deposited films.
- Customizable Design: Available in various sizes, shapes, and surface treatments to meet customer requirements.

3. Application Fields
- Semiconductor Manufacturing: Used for depositing materials such as silicon wafers, GaN, and SiC.
- Optical Coatings: Used for preparing optical films like anti-reflective and reflective coatings.
- Diamond Film Deposition: Used for diamond coatings on tools, molds, and other surfaces.
- Scientific Research: Suitable for material research and new process development under high-temperature and high-pressure conditions.

4. Technical Parameters
- Material: High-purity molybdenum (Mo)
- Melting Point: 2620°C
- Thermal Conductivity: 138 W/m·K
- Density: 10.2 g/cm3
- Purity: ≥99.95%
- Dimensions: Customizable (diameter, thickness, etc.)
- Surface Treatment: Customizable options such as polishing and coating.

5. Product Advantages
- High Performance: Maintains stability under extreme conditions, ensuring process consistency.
- Long Service Life: Resistant to high temperatures and corrosion, reducing equipment downtime and maintenance costs.
- High Precision: High surface flatness ensures uniform film deposition.
- Customization Services: Provides personalized design and manufacturing services based on customer needs.
- Quality After-Sales Service: Offers comprehensive technical support and maintenance services.

6. Usage and Maintenance
- Installation: Ensure the substrate holder matches the equipment to avoid mechanical stress.
- Cleaning: Regularly remove surface contaminants to maintain high purity and performance.
- Inspection: Periodically check for wear and corrosion, and replace or maintain as needed.

7. Compatible Equipment
- MPCVD Equipment
- Chemical Vapor Deposition (CVD) Equipment
- Plasma-Enhanced Chemical Vapor Deposition (PECVD) Equipment
- Other High-Temperature Thin Film Deposition Equipment

The MPCVD molybdenum substrate holder, with its excellent performance and reliability, plays a vital role in semiconductor manufacturing, optical coatings, diamond film deposition, and other fields. Whether for large-scale production or scientific research, the molybdenum substrate holder provides efficient and stable support, making it a core component in MPCVD equipment.

For more information or customization services, please contact our sales team. We will provide professional solutions and high-quality services!